11. Elnashaie, S. S. E. H, Abashar, M. E., Alhabdan, F. M. , Abdalla, B. K., 1995, 12-15 June. Mathematical modelling of Si layers oxidation and etching of Si and SiO2 layers.

Conference Paper

• تاريخ المؤتمر: الاثنين, تشرين اﻷول (أكتوبر) 9, 2017

مستخلص المنشور

Elnashaie, S. S. E. H, Abashar, M. E., Alhabdan, F. M. , Abdalla, B. K., 1995, 12-15 June. Mathematical modelling of Si layers oxidation and etching of Si and SiO2 layers. Proceedings of the International Conference on Advances in Strategic Technologies (ICAST), Bangi, Selangor, Malaysia.